The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2014
Filed:
Jun. 29, 2011
Frank Y. Xu, Round Rock, TX (US);
Jun Sung Chun, Austin, TX (US);
Michael P. C. Watts, Austin, TX (US);
Frank Y. Xu, Round Rock, TX (US);
Jun Sung Chun, Austin, TX (US);
Michael P. C. Watts, Austin, TX (US);
Canon Nanotechnologies, Inc., Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
Abstract
A polymerizable composition includes an organic modified silicate selected from the group consisting of silsesquioxanes having the composition RSiO, partially condensed alkoxysilanes, organically modified silicates having the composition RSiOand RSiO, and partially condensed orthosilicates having the composition SiOR, where R is an organic substituent; a decomposable organic compound; a photoinitiator; and a release agent. The composition polymerizes upon exposure to UV radiation to form an inorganic silica network, and the decomposable organic compound decomposes upon exposure to heat to form pores in the inorganic silica network. The composition may be used to form a patterned dielectric layer in an integrated circuit device. A metallic film may be disposed on the patterned dielectric layer and then planarized.