The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Feb. 03, 2010
Michael Johannes Vervoordeldonk, Rosmalen, NL;
Ronald Casper Kunst, Geldrop, NL;
Youssef Karel Maria DE Vos, Lille, BE;
Johannes Hubertus Antonius Van DE Rijdt, Gemert, NL;
Robertus Jacobus Theodorus Van Kempen, Boekel, NL;
Michael Johannes Vervoordeldonk, Rosmalen, NL;
Ronald Casper Kunst, Geldrop, NL;
Youssef Karel Maria De Vos, Lille, BE;
Johannes Hubertus Antonius Van De Rijdt, Gemert, NL;
Robertus Jacobus Theodorus Van Kempen, Boekel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate on a central area; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate in a first direction. The apparatus further includes a positioning device to position the substrate table, wherein the positioning device includes a plurality of actuators arranged to, in use, exert forces to position the substrate table, the forces substantially being directed in a plane substantially perpendicular to the first direction and wherein the plurality of actuators are arranged outside a central volume of the substrate table, the central volume being obtained by projecting the central area along the first direction.