The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Feb. 16, 2012
Applicant:
Alon Rosenthal, Delft, NL;
Inventor:
Alon Rosenthal, Delft, NL;
Assignee:
Mapper Lithography IP B.V., Delft, NL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/08 (2006.01); H01J 37/09 (2006.01); G03F 7/20 (2006.01); H01J 37/317 (2006.01); H01L 21/67 (2006.01); H01J 37/147 (2006.01); B82Y 40/00 (2011.01); B82Y 10/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/70858 (2013.01); H01J 2237/31793 (2013.01); H01J 37/3177 (2013.01); H01L 21/67213 (2013.01); H01J 2237/31754 (2013.01); H01J 2237/31774 (2013.01); G03F 7/708 (2013.01); H01L 21/6719 (2013.01); H01J 37/1475 (2013.01); H01J 2237/0264 (2013.01); B82Y 40/00 (2013.01); H01J 37/09 (2013.01); H01J 37/3174 (2013.01); B82Y 10/00 (2013.01);
Abstract
The invention relates to a system for magnetically shielding a charged particle lithography apparatus. The system comprises a first chamber, a second chamber and a set of two coils. The first chamber has walls comprising a magnetic shielding material, and, at least partially, encloses the charged particle lithography apparatus. The second chamber also has walls comprising a magnetic shielding material, and encloses the first chamber. The set of two coils is disposed in the second chamber on opposing sides of the first chamber. The two coils have a common axis.