The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Jun. 28, 2012
Esther Jeng, Los Altos, CA (US);
Anand Chandrashekar, Fremont, CA (US);
Raashina Humayun, Fremont, CA (US);
Michal Danek, Cupertino, CA (US);
Ronald Powell, Portola Valley, CA (US);
Esther Jeng, Los Altos, CA (US);
Anand Chandrashekar, Fremont, CA (US);
Raashina Humayun, Fremont, CA (US);
Michal Danek, Cupertino, CA (US);
Ronald Powell, Portola Valley, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
A method for filling a recessed feature of a substrate includes a) at least partially filling a recessed feature of a substrate with tungsten-containing film using at least one of chemical vapor deposition (CVD) and atomic layer deposition (ALD); b) at a predetermined temperature, using an etchant including activated fluorine species to selectively etch the tungsten-containing film more than an underlying material of the recessed feature without removing all of the tungsten-containing film at a bottom of the recessed feature; and c) filling the recessed feature using at least one of CVD and ALD.