The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2014

Filed:

Oct. 24, 2011
Applicants:

Toshinari Arai, Yokohama, JP;

Kazushige Hashimoto, Yokohama, JP;

Inventors:

Toshinari Arai, Yokohama, JP;

Kazushige Hashimoto, Yokohama, JP;

Assignee:

V Technology Co., Ltd., Yokohama-Shi, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01); G03B 27/10 (2006.01);
U.S. Cl.
CPC ...
G03F 7/20 (2013.01); G03F 9/00 (2013.01); G03F 7/70791 (2013.01); G03B 27/10 (2013.01); Y10S 430/146 (2013.01);
Abstract

On a film where an exposure material coating has been formed in a exposure pattern formation region on a film base material, a colored firing material, colored light-curable material, or colored ink is applied to at least one of two widthwise side edges to form a side part application coating, which is irradiated with laser light by an alignment mark formation unit to form an alignment mark. The alignment mark is then used to detect film meandering and adjust the positions of masks. This makes it easy to form the alignment mark and detect the alignment mark thus formed and makes it possible to accurately correct for meandering of a film and stably expose the film in the process of continuous exposure of a film where an exposure material coating has been formed in a exposure pattern formation region on a film base material.


Find Patent Forward Citations

Loading…