The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2014
Filed:
Nov. 20, 2013
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Karl-Eugen Aubele, Geislingen/Steige, DE;
Sven Ulmer, Aalen, DE;
Klaus Rief, Aalen-Oberalfingen, DE;
Marco Jassmann, Neresheim-Dorfmerkingen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/72 (2006.01); G03B 27/54 (2006.01); G03F 7/20 (2006.01); G02B 7/00 (2006.01); H02N 2/02 (2006.01); H02N 2/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70191 (2013.01); H02N 2/021 (2013.01); G03F 7/70258 (2013.01); H02N 2/06 (2013.01); G03F 7/70825 (2013.01); G02B 7/005 (2013.01);
Abstract
A projection exposure apparatus for microlithography includes an optical element actuatable by a first and a second actuator. The actuators are controlled via control intervals in such a way that a minimum deflectability predefined in accordance with a preselectable parameter is guaranteed at every point in time of the control.