The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2014
Filed:
Mar. 13, 2009
Tadashi Kontani, Toyama, JP;
Tetsuo Yamamoto, Toyama, JP;
Nobuhito Shima, Imizu, JP;
Nobuo Ishimaru, Takaoka, JP;
Tadashi Kontani, Toyama, JP;
Tetsuo Yamamoto, Toyama, JP;
Nobuhito Shima, Imizu, JP;
Nobuo Ishimaru, Takaoka, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Abstract
A substrate processing apparatus includes a processing chamber in which a substrate is mounted, a gas supply unit that supplies processing gas into the processing chamber, a gas exhaust unit that exhausts atmospheric gas in the processing chamber, first and second electrodes to which high-frequency power is applied to set the processing gas to an active state. Each of the first and second electrodes includes a core wire formed of a metal and plural pipe bodies that are joined to one another through the core wire so as to be bendable, and less thermally deformed than the core wire.