The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2014

Filed:

Feb. 04, 2013
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Brian M. Czabaj, Essex Junction, VT (US);

David A. DeMuynck, Underhill, VT (US);

Anthony K. Stamper, Williston, VT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/84 (2006.01); B81C 1/00 (2006.01); G06F 17/50 (2006.01); H01H 57/00 (2006.01);
U.S. Cl.
CPC ...
H01L 29/84 (2013.01); B81B 2201/014 (2013.01); B81B 2203/0118 (2013.01); H01H 2057/006 (2013.01); B81C 1/00246 (2013.01); G06F 17/5068 (2013.01);
Abstract

Micro-Electro-Mechanical System (MEMS) structures, methods of manufacture and design structures are disclosed. The method includes layering metal and insulator materials on a sacrificial material formed on a substrate. The method further includes masking the layered metal and insulator materials. The method further includes forming an opening in the masking which overlaps with the sacrificial material. The method further includes etching the layered metal and insulator materials in a single etching process to form the beam structure, such that edges of the layered metal and insulator material are aligned. The method further includes forming a cavity about the beam structure through a venting.


Find Patent Forward Citations

Loading…