The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8871312 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 28, 2014

Filed:

Sep. 10, 2012
Applicants:

Jennifer Y. Sun, Sunnyvale, CA (US);

Kenneth S. Collins, San Jose, CA (US);

Ren-guan Duan, San Jose, CA (US);

Senh Thach, Union City, CA (US);

Thomas Graves, Los Altos, CA (US);

Xiaoming He, Arcadia, CA (US);

Jie Yuan, San Jose, CA (US);

Inventors:

Jennifer Y. Sun, Sunnyvale, CA (US);

Kenneth S. Collins, San Jose, CA (US);

Ren-Guan Duan, San Jose, CA (US);

Senh Thach, Union City, CA (US);

Thomas Graves, Los Altos, CA (US);

Xiaoming He, Arcadia, CA (US);

Jie Yuan, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C04B 35/505 (2006.01); B32B 18/00 (2006.01); C04B 35/50 (2006.01); C04B 35/486 (2006.01); C04B 35/495 (2006.01);
U.S. Cl.
CPC ...
C04B 35/505 (2013.01); C04B 2235/3244 (2013.01); C04B 35/50 (2013.01); C04B 2235/762 (2013.01); C04B 2235/404 (2013.01); C04B 2235/3225 (2013.01); C04B 2235/80 (2013.01); C04B 2235/3222 (2013.01); C04B 2235/81 (2013.01); C04B 2235/3251 (2013.01); C04B 2235/77 (2013.01); C04B 2235/3217 (2013.01); C04B 2235/3229 (2013.01); C04B 2235/3255 (2013.01); C04B 35/486 (2013.01); C04B 2235/3224 (2013.01); C04B 35/495 (2013.01);
Abstract

Specialty ceramic materials which resist corrosion/erosion under semiconductor processing conditions which employ a corrosive/erosive plasma. The corrosive plasma may be a halogen-containing plasma. The specialty ceramic materials have been modified to provide a controlled electrical resistivity which suppresses plasma arcing potential.


Find Patent Forward Citations

Sun, Jennifer. (2014). Method of reducing plasma arcing on surfaces of semiconductor processing apparatus components in a plasma processing chamber (U.S. Patent No. 8871312). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8871312

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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