The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2014
Filed:
Dec. 20, 2010
George A. Dunbar, Iii, Essex Junction, VT (US);
Zhong-xiang He, Essex Junction, VT (US);
Jeffrey C. Maling, Grand Isle, VT (US);
William J. Murphy, North Ferrisburgh, VT (US);
Anthony K. Stamper, Williston, VT (US);
George A. Dunbar, III, Essex Junction, VT (US);
Zhong-Xiang He, Essex Junction, VT (US);
Jeffrey C. Maling, Grand Isle, VT (US);
William J. Murphy, North Ferrisburgh, VT (US);
Anthony K. Stamper, Williston, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a lower wiring layer on a substrate. The method further includes forming a plurality of discrete wires from the lower wiring layer. The method further includes forming an electrode beam over the plurality of discrete wires. The at least one of the forming of the electrode beam and the plurality of discrete wires are formed with a layout which minimizes hillocks and triple points in subsequent silicon deposition.