The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2014

Filed:

Aug. 03, 2011
Applicants:

Renhe Jia, Berkeley, CA (US);

Adam Brand, Palo Alto, CA (US);

Liming Zhang, San Jose, CA (US);

Dapeng Wang, Santa Clara, CA (US);

Tzay-fa Su, San Jose, CA (US);

Vijay Parihar, Fremont, CA (US);

Inventors:

Renhe Jia, Berkeley, CA (US);

Adam Brand, Palo Alto, CA (US);

Liming Zhang, San Jose, CA (US);

Dapeng Wang, Santa Clara, CA (US);

Tzay-Fa Su, San Jose, CA (US);

Vijay Parihar, Fremont, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/00 (2006.01); B08B 3/12 (2006.01); H01L 31/18 (2006.01); B23K 26/16 (2006.01); H01L 31/0392 (2006.01); B23K 26/36 (2014.01); B08B 3/08 (2006.01);
U.S. Cl.
CPC ...
B08B 3/08 (2013.01); B08B 3/12 (2013.01); H01L 31/18 (2013.01); Y02E 10/50 (2013.01); B23K 26/16 (2013.01); H01L 31/0392 (2013.01); B23K 26/367 (2013.01);
Abstract

A method of processing a substrate having a transparent conductive oxide disposed thereon, including: exposing the substrate to a first cleaning solution comprising hydrogen peroxide and ammonium citrate; exposing the substrate to a second cleaning solution having a pH within a range from about 6 to about 7, the second cleaning solution different than the first cleaning solution; agitating the second cleaning solution; and depositing a silicon-containing film on the transparent conductive oxide.


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