The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Sep. 06, 2013
International Business Machines Corporation, Armonk, NY (US);
Nathalie Casati, Zurich, CH;
David L. DeMaris, Austin, TX (US);
Frank De Morsier, Lausanne, CH;
Virginia Estellers Casas, Los Angeles, CA (US);
Maria Gabrani, Thalwil, CH;
International Business Machines Corporation, Armonk, NY (US);
Abstract
Candidate layout patterns can be assessed using a sparse pattern dictionary of known design layout patterns by determining sparse coefficients for each candidate pattern, reconstructing the respective candidate pattern, and determining reconstruction error. Any pattern with reconstruction error over a threshold value can be flagged. Compressive sampling can be employed, such as by projecting each candidate pattern onto a random line or a random matrix. The dictionary can be built by determining sparse coefficients of known patterns and respective basis function sets using matching pursuit, variants of SVD, and/or other techniques.