The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Jun. 30, 2011
Sytse Postma, Eindhoven, NL;
Marcus Adrianus Van DE Kerkhof, Helmond, NL;
Bearrach Moest, Eindhoven, NL;
Vasco Miguel Matias Serrao, Hasselt, BE;
Sytse Postma, Eindhoven, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Bearrach Moest, Eindhoven, NL;
Vasco Miguel Matias Serrao, Hasselt, BE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Disclosed is a device manufacturing method and associated apparatus, the method comprising transferring a pattern from a patterning device onto a substrate. The method relates to the alignment of said patterning device and said substrate, and comprises imparting a radiation beam onto an alignment structure on said patterning device so as to obtain a resultant aerial image; scanning an image sensor in accordance with a scanning scheme, through a target volume containing said resultant aerial image, the relative positions of said image sensor and said substrate being known or subsequently determined; and measuring features of said image and thereby determining of the location of the alignment structure relative to the image sensor; wherein an alternative scanning scheme is used in which, for example two or more scans through the whole target volume are performed, having a total duration the same as a conventional single continuous scan.