The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Sep. 22, 2011
Applicants:
Pieter Renaat Maria Hennus, Peer, BE;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Patrick Johannes Cornelus Hendrik Smulders, Best, NL;
Peter Smits, Baarlo, NL;
Inventors:
Pieter Renaat Maria Hennus, Peer, BE;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Patrick Johannes Cornelus Hendrik Smulders, Best, NL;
Peter Smits, Baarlo, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01); G03F 7/70808 (2013.01); G03F 7/709 (2013.01); G03F 7/707 (2013.01); G03F 7/7085 (2013.01);
Abstract
A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.