The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2014

Filed:

May. 25, 2012
Applicants:

Michael Moriarty, Portland, OR (US);

Stacey Stone, Beaverton, OR (US);

Jeff Blackwood, Portland, OR (US);

Inventors:

Michael Moriarty, Portland, OR (US);

Stacey Stone, Beaverton, OR (US);

Jeff Blackwood, Portland, OR (US);

Assignee:

FEI Company, Hillsboro, OR (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); H01L 21/02 (2006.01); G01N 1/28 (2006.01); H01J 37/305 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02318 (2013.01); G01N 1/286 (2013.01); H01J 2237/31745 (2013.01); G01N 2001/2886 (2013.01); H01J 37/3056 (2013.01);
Abstract

A method and apparatus for preparing thin TEM samples in a manner that reduces or prevents bending and curtaining is realized. Embodiments of the present invention deposit material onto the face of a TEM sample during the process of preparing the sample. In some embodiments, the material can be deposited on a sample face that has already been thinned before the opposite face is thinned, which can serve to reinforce the structural integrity of the sample and refill areas that have been over-thinned due to a curtaining phenomena. In other embodiments, material can also be deposited onto the face being milled, which can serve to reduce or eliminate curtaining on the sample face.


Find Patent Forward Citations

Loading…