The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Jun. 22, 2012
Yuki Chiba, East Greenbush, NY (US);
Yuki Chiba, East Greenbush, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method for protecting an exposed low-k surface is described. The method includes providing a substrate having a low-k insulation layer formed thereon and one or more mask layers overlying the low-k insulation layer with a pattern formed therein. Additionally, the method includes transferring the pattern in the one or more mask layers to the low-k insulation layer using one or more etching processes to form a trench and/or via structure in the low-k insulation layer. The method further includes forming an insulation protection layer on exposed surfaces of the trench and/or via structure during and/or following the one or more etching processes by exposing the substrate to a film forming compound containing C, H, and N. Thereafter, the method includes removing at least a portion of the one or more mask layers using a mask removal process.