The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Mar. 16, 2010
Gang He, Cupertino, CA (US);
Gregg Higashi, San Jose, CA (US);
Khurshed Sorabji, San Jose, CA (US);
Roger Hamamjy, San Jose, CA (US);
Andreas Hegedus, Burlingame, CA (US);
Gang He, Cupertino, CA (US);
Gregg Higashi, San Jose, CA (US);
Khurshed Sorabji, San Jose, CA (US);
Roger Hamamjy, San Jose, CA (US);
Andreas Hegedus, Burlingame, CA (US);
Alta Devices, Inc., Sunnyvale, CA (US);
Abstract
Embodiments of the invention generally relate to methods for chemical vapor deposition (CVD) processes. In one embodiment, a method for heating a substrate or a substrate susceptor within a vapor deposition reactor system includes exposing a lower surface of a substrate susceptor, such as a wafer carrier, to energy emitted from a heating lamp assembly, and heating the substrate susceptor to a predetermined temperature. The heating lamp assembly generally contains a lamp housing disposed on an upper surface of a support base and contains at least one lamp holder, a plurality of lamps extending from the lamp holder, and a reflector disposed on the upper surface of the support base, next to the lamp holder, and below the lamps. The plurality of lamps may have split filament lamps and/or non-split filament lamps for heating inner and outer portions of the substrate susceptor.