The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2014

Filed:

Nov. 05, 2012
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Sang-Uk Han, Hwaseong-si, KR;

Jeong-Kyu Ha, Hwaseong-si, KR;

Young-Shin Kwon, Osan-si, KR;

Seung-Hwan Kim, Hwaseong-si, KR;

Kwan-Jai Lee, Yongin-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/58 (2006.01); H01L 23/498 (2006.01); H01L 23/495 (2006.01); H01L 21/66 (2006.01); H01L 23/14 (2006.01);
U.S. Cl.
CPC ...
H01L 23/49524 (2013.01); H01L 23/145 (2013.01); H01L 23/4985 (2013.01); H01L 23/49827 (2013.01); H01L 23/49838 (2013.01); H01L 22/32 (2013.01);
Abstract

Provided are a chip on film (COF) package and semiconductor having the same. The COF package can include a flexible film having first and second surfaces opposite to and facing each other and including a conductive via penetrating from the first surface to the second surface, first and second conductive patterns respectively is on the first surface and the second surface and electrically connected to each other through the conductive via, an integrated circuit (IC) chip is on the first surface and electrically connected to the first conductive pattern, a test pad overlaps the conductive via and is electrically connected to at least one of the first conductive pattern and the second conductive pattern, and an external connection pattern is on the second surface spaced apart from the conductive via and electrically connected to the second conductive pattern.


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