The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Aug. 04, 2009
Tatsuya Yanagida, Hiratsuka, JP;
Masaki Nakano, Yokohama, JP;
Akira Endo, Tokyo, JP;
Gigaphoton Inc., Tochigi, JP;
Abstract
Offset in the ejection direction of target material droplets is corrected in order to stabilize EUV output in an EUV light source device. An extreme ultraviolet light source device includes a droplet generation devicethat outputs target material dropletstowards a predetermined plasma emission point; a charging devicethat charges the target material droplets; a trajectory correction devicethat generates a force field in the trajectory to correct the travel direction of the charged target material dropletsso that the charged target material dropletstravel towards the plasma emission point; and a laser light sourcethat irradiates, at the plasma emission point, a laser beam onto the charged target material to generate plasma thereby.