The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2014

Filed:

Feb. 18, 2014
Applicants:

Ilya Bezel, Sunnyvale, CA (US);

Anatoly Shchemelinin, Pleasanton, CA (US);

Alex Salnik, San Jose, CA (US);

Anant Chimmalgi, San Jose, CA (US);

Inventors:

Ilya Bezel, Sunnyvale, CA (US);

Anatoly Shchemelinin, Pleasanton, CA (US);

Alex Salnik, San Jose, CA (US);

Anant Chimmalgi, San Jose, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F21V 5/00 (2006.01); F21V 7/00 (2006.01); F21V 13/04 (2006.01); H01J 37/32 (2006.01); H01J 61/02 (2006.01);
U.S. Cl.
CPC ...
H01J 61/02 (2013.01);
Abstract

A laser-sustained plasma illuminator system includes at least one laser light source to provide light. At least one reflector focuses the light from the laser light source at a focal point of the reflector. An enclosure substantially filled with a gas is positioned at or near the focal point of the reflector. The light from the laser light source at least partially sustains a plasma contained in the enclosure. The enclosure has at least one wall with a thickness that is varied to compensate for optical aberrations in the system.


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