The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Jul. 09, 2009
Marcus Straw, Portland, OR (US);
Amin Samsavar, Lake Oswego, OR (US);
Milos Toth, Portland, OR (US);
Mark Utlaut, Scappoose, OR (US);
Marcus Straw, Portland, OR (US);
Amin Samsavar, Lake Oswego, OR (US);
Milos Toth, Portland, OR (US);
Mark Utlaut, Scappoose, OR (US);
FEI Company, Hillsboro, OR (US);
Abstract
A charged particle beam and a laser beam are used together to micromachine a substrate. A first beam alters the state of a region of the work piece, and the second beam removes material whose state was altered. In one embodiment, an ion beam can create photon absorbing defects to lower the local ablation threshold, allowing the laser beam to remove material in a region defined by the ion beam. The combination of laser beam and charged particle beam allows the creation of features similar in size to the charged particle beam spot size, at milling rates greater than charged particle processing because of the increased energy provided by the laser beam.