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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8853441 B1

PDFFull Text
Date of Patent:
Oct. 07, 2014

Filed:

Jul. 25, 2012

Sulfonium compound, photoacid generator, and resist composition

Applicants:

Jung Hoon OH, Chungcheongnam-do, KR;

Dae Kyung Yoon, Chungcheongnam-do, KR;

Seung Duk Cho, Chungcheongnam-do, KR;

SO Jeong Park, Chungcheongnam-do, KR;

Inventors:

Jung Hoon Oh, Chungcheongnam-do, KR;

Dae Kyung Yoon, Chungcheongnam-do, KR;

Seung Duk Cho, Chungcheongnam-do, KR;

So Jeong Park, Chungcheongnam-do, KR;

Assignee:

Korea Kumho Petrochemical Co., Ltd., Seoul, KR;

Attorney:

Davidson, Davidson & Kappel, LLC

Primary Examiner:

Fereydoun G Sajjadi

Assistant Examiner:

Amy C Bonaparte

Int. Cl.
CPC ...
C07C 69/013 (2006.01); C07C 69/017 (2006.01); C07C 309/02 (2006.01); C07C 309/39 (2006.01); C07C 309/44 (2006.01); C07C 381/12 (2006.01); G03F 7/00 (2006.01); C07C 309/12 (2006.01); G03F 7/004 (2006.01); C07D 333/46 (2006.01); C07C 309/06 (2006.01); C07D 307/64 (2006.01); G03C 1/00 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
C07C 309/06 (2013.01); C07C 381/12 (2013.01); G03F 7/00 (2013.01); C07C 309/12 (2013.01); C07C 309/02 (2013.01); G03F 7/0046 (2013.01); C07D 333/46 (2013.01); G03F 7/0045 (2013.01); C07C 2102/42 (2013.01); C07C 2103/74 (2013.01); G03F 7/0397 (2013.01); C07D 307/64 (2013.01); G03F 7/0395 (2013.01); G03F 7/004 (2013.01);
Abstract

A sulfonium compound represented by the following formula (1), a photoacid generator containing the sulfonium compound, and a resist composition containing the photoacid generator are provided: wherein X represents an electron donor group; Rand Reach independently represent an alkyl group or the like; Rto Reach independently represent an alkyl group, or the like; Rrepresents a cyclic alkenediyl group or the like; and −A represents an anion. The sulfonium compound has a photon yield that is controllable by introducing different absorbers to the cation region in one molecule, can address the inconvenience of using a mixture of different photoacid generators when the sulfonium compound is applied as a photoacid generator, has excellent miscibility in a resist, and has enhanced resolution and line edge roughness.

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