The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2014

Filed:

Feb. 13, 2009
Applicants:

Satoko Gatineau, Ibaraki, JP;

Christian Dussarrat, Wilmington, DE (US);

Christophe Lachaud, Saint Michel sur Orge, FR;

Nicolas Blasco, Grenoble, FR;

Audrey Pinchart, Antony, FR;

Ziyun Wang, Newark, DE (US);

Jean-marc Girard, Paris, FR;

Andreas Zauner, Voisons le Bretonneux, FR;

Inventors:

Satoko Gatineau, Ibaraki, JP;

Christian Dussarrat, Wilmington, DE (US);

Christophe Lachaud, Saint Michel sur Orge, FR;

Nicolas Blasco, Grenoble, FR;

Audrey Pinchart, Antony, FR;

Ziyun Wang, Newark, DE (US);

Jean-Marc Girard, Paris, FR;

Andreas Zauner, Voisons le Bretonneux, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01); H01J 31/12 (2006.01); H01J 29/86 (2006.01);
U.S. Cl.
CPC ...
H01J 29/86 (2013.01); H01J 31/127 (2013.01); H01J 2201/30469 (2013.01);
Abstract

Methods of forming titanium-containing layers on substrates are disclosed. In the disclosed methods, the vapor of a precursor compound having the formula Ti(MeCp)(OR), wherein R is selected from methyl, ethyl, or isopropyl is provided. The vapor is reacted with the substrate according to an atomic layer deposition process to form a titanium-containing complex on the surface of the substrate.


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