The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Dec. 18, 2013
Applicant:
Koji Kaneyama, Kyoto, JP;
Inventor:
Koji Kaneyama, Kyoto, JP;
Assignee:
Sokudo Co., Ltd., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D 5/00 (2006.01); B05C 13/02 (2006.01); G03B 27/58 (2006.01); H01L 21/677 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70975 (2013.01); G03B 27/58 (2013.01); H01L 21/67745 (2013.01); H01L 21/68707 (2013.01); H01L 21/67051 (2013.01); H01L 21/67046 (2013.01); G03F 7/70741 (2013.01); Y10S 134/902 (2013.01);
Abstract
A substrate processing method for a substrate having a photosensitive film on a top surface thereof, includes cleaning a back surface of the substrate after the formation of the photosensitive film and before exposure processing; transporting the substrate to a temperature adjuster such as a cooling unit, while holding the substrate with a first holder; adjusting a temperature of the substrate with the temperature adjuster; transporting the substrate from the temperature adjuster to the exposure device with a second holder; and transporting the substrate after the exposure processing to a first platform while holding the substrate with a third holder.