The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Feb. 22, 2010
Applicants:
Rajinder Dhindsa, San Jose, CA (US);
Eric Lenz, Pleasanton, CA (US);
Inventors:
Rajinder Dhindsa, San Jose, CA (US);
Eric Lenz, Pleasanton, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); B44C 1/22 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32009 (2013.01); H01J 37/32082 (2013.01); H01J 37/3244 (2013.01); H01J 37/32724 (2013.01);
Abstract
A plasma processing apparatus includes a heater in thermal contact with a showerhead electrode, and a temperature controlled top plate in thermal contact with the heater to maintain a desired temperature of the showerhead electrode during semiconductor substrate processing. A gas distribution member supplies a process gas and radio frequency (RF) power to the showerhead electrode.