The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8845909 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 30, 2014

Filed:

May. 30, 2013
Applicant:

Tzu-shih Shen, Hsinchu, TW;

Inventor:

Tzu-Shih Shen, Hsinchu, TW;

Assignee:

Subtron Technology Co., Ltd., Hsinchu County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/207 (2006.01); H01L 23/14 (2006.01); H01L 21/48 (2006.01); F28F 13/00 (2006.01); H01L 33/64 (2010.01); H01L 23/13 (2006.01); F28D 21/00 (2006.01); F28F 21/08 (2006.01);
U.S. Cl.
CPC ...
H01L 33/64 (2013.01); H01L 23/142 (2013.01); H01L 21/4878 (2013.01); H01L 2224/48091 (2013.01); F28F 13/00 (2013.01); F28D 2021/0029 (2013.01); F28F 21/085 (2013.01); H01L 23/13 (2013.01);
Abstract

A process of fabricating a heat dissipation substrate is provided. A metal substrate having an upper surface, a lower surface, first recesses located on the upper surface and second recesses located on the lower surface is provided. The metal substrate is divided into carrier units and connecting units connecting the carrier units. A first and a second insulating materials are respectively filled into the first and the recesses. A first conductive layer is formed on the upper surface and the first insulating material. A second conductive layer is formed on the lower surface and the second insulating material. The first and the second conductive layers are patterned to form a first and a second patterned conductive layers. The first and the second insulating materials are taken as an etching mask to etch the connecting units of the metal substrate so as to form a plurality of individual heat dissipation substrates.


Find Patent Forward Citations

Shen, Tzu-Shih. (2014). Process of fabricating heat dissipation substrate (U.S. Patent No. 8845909). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8845909

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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