The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Feb. 29, 2012
Adauto Diaz, Saratoga, CA (US);
Andrew Nguyen, San Jose, CA (US);
Benjamin Schwarz, San Jose, CA (US);
Eu Jin Lim, Sunnyvale, CA (US);
Jared Ahmad Lee, Santa Clara, CA (US);
James P. Cruse, Soquel, CA (US);
LI Zhang, Mountain View, CA (US);
Scott M. Williams, Sunnyvale, CA (US);
Xiaoliang Zhuang, Santa Clara, CA (US);
Zhuang LI, San Jose, CA (US);
Adauto Diaz, Saratoga, CA (US);
Andrew Nguyen, San Jose, CA (US);
Benjamin Schwarz, San Jose, CA (US);
Eu Jin Lim, Sunnyvale, CA (US);
Jared Ahmad Lee, Santa Clara, CA (US);
James P. Cruse, Soquel, CA (US);
Li Zhang, Mountain View, CA (US);
Scott M. Williams, Sunnyvale, CA (US);
Xiaoliang Zhuang, Santa Clara, CA (US);
Zhuang Li, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods for reducing the contamination of a gas distribution plate are provided. In one embodiment, a method for processing a substrate includes transferring the substrate into a chamber, performing a treating process on the substrate, and providing a purge gas into the chamber before or after the treating process to pump out a residue gas relative to the treating process from the chamber. The treating process includes distributing a reactant gas into the chamber through a gas distribution plate.