The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2014
Filed:
Jul. 08, 2011
Udo Meyer, Bremen, DE;
Susanne Markus, Bremen, DE;
Stefan Dieckhoff, Lilienthal, DE;
Abstract
A device for testing the quality of microstructurization of a surface () having a known target microstructurization quality, comprising a radiation source () for coherent radiation, a first detector () and a second detector () and a masking system, all of which are set up and arranged with respect to one another so that radiation emitted by the radiation source () onto the surface () produces a diffraction pattern, wherein the diffraction maximum of order n of the diffraction pattern without the masking system would impinge on the first detector (), the masking system prevents 80% of the photons that are assigned to the diffraction maximum of order n from impinging on the first detector and the diffraction maximum of order a of the diffraction pattern impinges on the second detector (), wherein n is selected from the group consisting of 1, 2, 3, 4, 5, 6, 7, 8, 9 and 10 and a is selected from the group consisting of 1, 2, 3, 4, 5, 6, 7, 8, 9 and 10 and a≠n.