The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2014
Filed:
Dec. 29, 2011
Applicants:
Carlos R. Castro-pareja, Aloha, OR (US);
Allan Xiao Yu Gu, Portland, OR (US);
Inventors:
Carlos R. Castro-Pareja, Aloha, OR (US);
Allan Xiao Yu Gu, Portland, OR (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/68 (2012.01);
U.S. Cl.
CPC ...
G06F 17/50 (2013.01); G03F 1/68 (2013.01);
Abstract
Improved masks for double patterning lithography are described. In one example, conflict spaces between features of a target design are identified. The conflict spaces are represented as nodes of a graph. Connections are inserted between nodes based on a local search. The connections are cut to determine double patterning mask assignment. The connections are extended to form a checkerboard that is then overlayed on the target mask design to split the features of the target mask design for double patterning.