The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2014
Filed:
Feb. 23, 2012
Pieter Mulder, Duizel, NL;
Jan Willem Cromwijk, Best, NL;
Jimmy Matheus Wilhelmus Van DE Winkel, Kessel, NL;
Marjan Leonardus Catharina Hoofman, Eindhoven, NL;
Ferdinand Bernardus Johannus Wilhelmus Maria Hendriks, Wijchen, NL;
Pieter Mulder, Duizel, NL;
Jan Willem Cromwijk, Best, NL;
Jimmy Matheus Wilhelmus Van De Winkel, Kessel, NL;
Marjan Leonardus Catharina Hoofman, Eindhoven, NL;
Ferdinand Bernardus Johannus Wilhelmus Maria Hendriks, Wijchen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus is disclosed having a projection system configured to direct a patterned beam of radiation onto a substrate and a liquid handling system configured to supply and confine immersion liquid to a space defined between the projection system and a substrate, or a substrate table, or both. A controller is provided to adjust an angle of a lower surface of the liquid handling system relative to the top surface of the substrate during motion of the substrate and/or substrate table relative to the liquid handling system dependent upon a position of the substrate and/or substrate table relative to the liquid handling system and/or a direction of relative movement between the substrate and/or substrate table and the liquid handling system.