The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2014

Filed:

Nov. 10, 2009
Applicants:

Jun-hee Lim, Seoul, KR;

Hyuck-chai Jung, Suwon-si, KR;

Inventors:

Jun-Hee Lim, Seoul, KR;

Hyuck-Chai Jung, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 27/108 (2006.01); H01L 21/265 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66621 (2013.01); H01L 28/90 (2013.01); H01L 27/10823 (2013.01); H01L 21/26586 (2013.01); H01L 27/10876 (2013.01);
Abstract

A recessed channel transistor, a semiconductor device including a transistor and methods of manufacturing the same are provided, the recessed channel transistor includes a gate structure, a second impurity region and a first impurity region. The gate structure may be formed on a substrate and filling a recess. The first impurity region, including first impurities, may be formed at a first upper portion of the substrate adjacent to the gate structure. The second impurity region, including second impurities, may be formed at a second upper portion of the substrate contacting the gate structure. The first impurity region may surround the second impurity region. The first impurities have a conductive type different from that of the second impurities.


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