The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2014
Filed:
Aug. 30, 2013
Fei Company, Hillsboro, OR (US);
Max-planck-gesellschaft Zur Foerderung Der Wissenschaften E.v., Munich, DE;
Bart Buijsse, Eindhoven, NL;
Marco Hugo Petrus Moers, Best, NL;
Radostin Stoyanov Danev, Munich, DE;
FEI Company, Hillsboro, OR (US);
Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V., , DE;
Abstract
The invention relates to a method of forming an image of a sample in a transmission electron microscope equipped with a phase plate. Prior art use of such a phase plate can introduce artifacts in the form of ringing and a halo. These artifacts are caused by the abrupt changes in the Fourier domain due to the sharp edges of the phase plate in the diffraction plane. By moving the phase plate with respect to the non-diffraction beam (the diffraction pattern) while recording an image the sudden transition in the Fourier domain is changed to a more gradual transition, resulting in less artifacts.