The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2014

Filed:

Oct. 18, 2013
Applicant:

Carl Zeiss Microscopy Gmbh, Jena, DE;

Inventor:

Lorenz Lechner, Koenigsbronn, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/28 (2006.01); H01J 37/26 (2006.01); H01J 37/305 (2006.01); G01N 1/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/26 (2013.01); H01J 37/28 (2013.01); G01N 1/32 (2013.01); H01J 2237/31745 (2013.01); H01J 37/3056 (2013.01);
Abstract

A method of processing a TEM-sample, wherein the method comprises: mounting an object in a particle beam system such that the object is disposed, in an object region of the particle beam system; directing of a first particle beam onto the object region from a first direction, wherein the first particle beam is an ion beam; and then rotating the object about an axis by 180°, wherein the following relation is fulfilled:35°≦α≦55°,wherein α denotes a first angle between the first direction and the axis; and then directing of the first particle beam onto the object region from the first direction; wherein material is removed from the object during the directing of the first particle beam onto the object region. Furthermore, a second particle beam may be directed onto the object region, and particles emanating from the object region can be detected.


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