The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2014
Filed:
Jun. 08, 2012
Hengpeng Wu, Hillsborough, NJ (US);
Orest Polishchuk, Bayonne, NJ (US);
Yi Cao, Clinton, NJ (US);
Sungeun Hong, Basking Ridge, NJ (US);
Jian Yin, Bridgewater, NJ (US);
Guanyang Lin, Whitehouse Station, NJ (US);
Margareta Paunescu, Clinton, NJ (US);
Mark Neisser, Whitehosue Station, NJ (US);
Hengpeng Wu, Hillsborough, NJ (US);
Orest Polishchuk, Bayonne, NJ (US);
Yi Cao, Clinton, NJ (US);
SungEun Hong, Basking Ridge, NJ (US);
Jian Yin, Bridgewater, NJ (US);
Guanyang Lin, Whitehouse Station, NJ (US);
Margareta Paunescu, Clinton, NJ (US);
Mark Neisser, Whitehosue Station, NJ (US);
AZ Electronic Materials (Luxembourg) S.A.R.L., Luxembourg, LU;
Abstract
The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1): wherein Rrepresents a C-Csubstituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and Ris a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.