The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2014
Filed:
Jan. 27, 2011
Takeru Watanabe, Jyoetsu, JP;
Takeshi Kinsho, Jyoetsu, JP;
Tsutomu Ogihara, Jyoetsu, JP;
Katsuya Takemura, Jyoetsu, JP;
Toshihiko Fujii, Jyoetsu, JP;
Daisuke Kori, Jyoetsu, JP;
Takeru Watanabe, Jyoetsu, JP;
Takeshi Kinsho, Jyoetsu, JP;
Tsutomu Ogihara, Jyoetsu, JP;
Katsuya Takemura, Jyoetsu, JP;
Toshihiko Fujii, Jyoetsu, JP;
Daisuke Kori, Jyoetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
There is disclosed a resist underlayer film composition of a multilayer resist film used in lithography including (A) a fullerene derivative having a carboxyl group protected by a thermally labile group and (B) an organic solvent. There can be a resist underlayer film composition of a multilayer resist film used in lithography for forming a resist underlayer in which generation of wiggling in substrate etching can be highly suppressed and the poisoning problem in forming an upper layer pattern using a chemically amplified resist can be avoided, a process for forming the resist underlayer film, a patterning process and a fullerene derivative.