The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2014
Filed:
May. 26, 2010
Applicants:
Takeharu Motokawa, Zushi, JP;
Hidehito Azumano, Yokohama, JP;
Inventors:
Takeharu Motokawa, Zushi, JP;
Hidehito Azumano, Yokohama, JP;
Assignees:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Shibaura Mechatronics Corporation, Kanagawa, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/08 (2006.01); H01L 21/306 (2006.01); H01J 37/32 (2006.01); G03F 1/46 (2012.01);
U.S. Cl.
CPC ...
H01J 37/32642 (2013.01); H01J 37/3255 (2013.01); H01J 37/32623 (2013.01); H01J 37/32541 (2013.01); G03F 1/46 (2013.01); H01J 2237/03 (2013.01); H01J 2237/022 (2013.01);
Abstract
According to one embodiment, a plasma etching apparatus includes an electrode to which a high-frequency voltage is applied, having an upper surface along which a processing target substrate is to be placed, and having an inclined side, and an electrode cover provided along the side of the electrode.