The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2014

Filed:

Sep. 06, 2013
Applicant:

Panasonic Corporation, Osaka, JP;

Inventors:

Shunsaku Muraoka, Osaka, JP;

Yoshihiko Kanzawa, Osaka, JP;

Satoru Mitani, Osaka, JP;

Koji Katayama, Nara, JP;

Kazuhiko Shimakawa, Osaka, JP;

Satoru Fujii, Osaka, JP;

Takeshi Takagi, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11C 11/21 (2006.01); H01L 45/00 (2006.01); G11C 13/00 (2006.01); H01L 27/24 (2006.01);
U.S. Cl.
CPC ...
H01L 45/147 (2013.01); G11C 2213/79 (2013.01); H01L 45/146 (2013.01); H01L 45/1675 (2013.01); G11C 13/0007 (2013.01); H01L 27/2436 (2013.01); G11C 2013/009 (2013.01); G11C 2213/32 (2013.01); H01L 45/1625 (2013.01); H01L 45/1233 (2013.01); G11C 2213/34 (2013.01); G11C 13/0069 (2013.01); G11C 2213/15 (2013.01); H01L 45/08 (2013.01);
Abstract

A variable resistance nonvolatile storage device which includes (i) a semiconductor substrate, (ii) a variable resistance element having: lower and upper electrodes; and a variable resistance layer whose resistance value reversibly varies based on voltage signals each of which has a different polarity and is applied between the electrodes, and (iii) a MOS transistor formed on the substrate, wherein the variable resistance layer includes: oxygen-deficient transition metal oxide layers having compositions MOand MO(where x<y) and in contact with the electrodes respectively, a diffusion layer region is connected with the lower electrode to form a memory cell, the region serving as a drain upon application of a voltage signal which causes a resistance change to high resistance state in the variable resistance layer.


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