The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2014
Filed:
Mar. 30, 2009
Arie Jeffrey Den Boef, Waalre, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
Marcus Adrianus Van DE Kerkhof, Helmond, NL;
Henricus Petrus Maria Pellemans, Veldhoven, NL;
Martin Ebert, Valkenswaard, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Henricus Petrus Maria Pellemans, Veldhoven, NL;
Martin Ebert, Valkenswaard, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of assessing a model of a substrate is presented. A scatterometry measurement is taken using radiation at a first wavelength. The wavelength of the radiation is then changed and a further scatterometry measurement taken. If the scatterometry measurements are consistent across a range of wavelengths then the model is sufficiently accurate. However, if the scatterometry measurements change as the wavelength changes then the model of the substrate is not sufficiently accurate.