The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2014
Filed:
Jun. 15, 2009
Taira Otsu, Ichinomiya, JP;
Keigo Ohashi, Gifu, JP;
Taira Otsu, Ichinomiya, JP;
Keigo Ohashi, Gifu, JP;
Fujimi Incorporated, Kiyosu-shi, JP;
Abstract
There is provided a polishing composition, containing abrasive grains and an acid represented either by R—R—SOH (wherein Ris a linear alkylene or hydroxyalkylene group having 1 to 4 carbon atoms, and Ris a hydroxy group, a carboxy group, or a sulfonic acid group when Ris the linear alkylene group, or Ris a carboxy group or a hydroxymethyl group when Ris the linear hydroxyalkylene group), or by CH—R(wherein Ris a sulfonic acid group or a phosphonic acid group). The acid contained in the polishing composition is preferably isethionic acid or benzenesulfonic acid. The polishing composition is mainly used in the application of polishing silicon oxide materials including glass substrates for hard disks, synthetic quartz substrates for photomasks, and low-dielectric-constant films such as silicon dioxide films, BPSG films, PSG films, FSG films, and organosiloxane films of semiconductor devices.