The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2014
Filed:
Jul. 12, 2012
Xinyu Gu, Lake Jackson, TX (US);
Shih-wei Chang, Natick, MA (US);
Phillip D. Hustad, Manvel, TX (US);
Jeffrey D. Weinhold, Lake Jackson, TX (US);
Peter Trefonas, Medway, MA (US);
Xinyu Gu, Lake Jackson, TX (US);
Shih-Wei Chang, Natick, MA (US);
Phillip D. Hustad, Manvel, TX (US);
Jeffrey D. Weinhold, Lake Jackson, TX (US);
Peter Trefonas, Medway, MA (US);
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Dow Global Technologies LLC, Midland, MI (US);
Abstract
A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(siloxane) block copolymer component; and, an antioxidant to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under a gaseous atmosphere for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(siloxane) in the annealed film to SiO.