The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2014
Filed:
Feb. 15, 2012
Applicants:
Herman Vogel, Sandy Hook, CT (US);
Klaus Simon, Eindhoven, NL;
Antonius Theodorus Anna Maria Derksen, Eindhoven, NL;
Inventors:
Herman Vogel, Sandy Hook, CT (US);
Klaus Simon, Eindhoven, NL;
Antonius Theodorus Anna Maria Derksen, Eindhoven, NL;
Assignee:
ASML Holding N.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/42 (2006.01); G03B 27/32 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/709 (2013.01); G03F 7/70358 (2013.01); G03F 7/70341 (2013.01);
Abstract
A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. Further, the liquid is extracted using a two dimensional array of extraction openings.