The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2014
Filed:
May. 29, 2012
Katherina Babich, Chappaqua, NY (US);
Alessandro Callegari, Yorktown Heights, NY (US);
Zhihong Chen, West Lafayette, IN (US);
Edward Kiewra, Verbank, NY (US);
Yanning Sun, White Plains, NY (US);
Katherina Babich, Chappaqua, NY (US);
Alessandro Callegari, Yorktown Heights, NY (US);
Zhihong Chen, West Lafayette, IN (US);
Edward Kiewra, Verbank, NY (US);
Yanning Sun, White Plains, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Techniques for forming a thin coating of a material on a carbon-based material are provided. In one aspect, a method for forming a thin coating on a surface of a carbon-based material is provided. The method includes the following steps. An ultra thin silicon nucleation layer is deposited to a thickness of from about two angstroms to about 10 angstroms on at least a portion of the surface of the carbon-based material to facilitate nucleation of the coating on the surface of the carbon-based material. The thin coating is deposited to a thickness of from about two angstroms to about 100 angstroms over the ultra thin silicon layer to form the thin coating on the surface of the carbon-based material.