The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2014
Filed:
Jan. 12, 2007
Applicants:
Thomas Ingolf Wallow, San Carlos, CA (US);
Ryoung-han Kim, San Jose, CA (US);
Jongwook Kye, Pleasanton, CA (US);
Harry Jay Levinson, Saratoga, CA (US);
Inventors:
Thomas Ingolf Wallow, San Carlos, CA (US);
Ryoung-han Kim, San Jose, CA (US);
Jongwook Kye, Pleasanton, CA (US);
Harry Jay Levinson, Saratoga, CA (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/027 (2006.01); G03F 7/40 (2006.01); H01L 21/311 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0273 (2013.01); G03F 7/40 (2013.01); H01L 21/31144 (2013.01); G03F 7/0035 (2013.01);
Abstract
A method for forming a semiconductor device is provided including processing a wafer having a target material, forming a multilevel photoresist structure having a protection layer over the target material, and forming a multilevel recess in the target material with the multilevel photoresist structure.