The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2014
Filed:
Dec. 02, 2011
Yasuhiko Matsuda, Tokyo, JP;
Tomohisa Fujisawa, Tokyo, JP;
Yukari Hama, Tokyo, JP;
Takanori Kawakami, Tokyo, JP;
Yasuhiko Matsuda, Tokyo, JP;
Tomohisa Fujisawa, Tokyo, JP;
Yukari Hama, Tokyo, JP;
Takanori Kawakami, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. Rrepresents a hydrogen atom, a methyl group or a trifluoromethyl group. Rrepresents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. Rrepresents a hydrogen atom or a monovalent organic group.