The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
Jun. 28, 2012
Jun Tao, Milpitas, CA (US);
Been-der Chen, Milpitas, CA (US);
Yen-wen LU, Los Altos, CA (US);
Jiangwei LI, Palo Alto, CA (US);
Min-chun Tsai, San Jose, CA (US);
Dong Mao, San Jose, CA (US);
Jun Tao, Milpitas, CA (US);
Been-Der Chen, Milpitas, CA (US);
Yen-Wen Lu, Los Altos, CA (US);
Jiangwei Li, Palo Alto, CA (US);
Min-Chun Tsai, San Jose, CA (US);
Dong Mao, San Jose, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Described herein is a method for obtaining a preferred layout for a lithographic process, the method comprising: identifying an initial layout including a plurality of features; and reconfiguring the features until a termination condition is satisfied, thereby obtaining the preferred layout; wherein the reconfiguring comprises evaluating a cost function that measures how a lithographic metric is affected by a set of changes to the features for a plurality of lithographic process conditions, and expanding the cost function into a series of terms at least some of which are functions of characteristics of the features.