The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
Aug. 26, 2011
Wei-cyuan Lo, Taichung, TW;
Yung-feng Cheng, Kaohsiung, TW;
Ming-jui Chen, Tainan, TW;
United Microelectronics Corp., Science-Based Industrial Park, Hsin-Chu, TW;
Abstract
A mask inspecting method includes the following steps. A processing parameter is defined. An incident light is decided by the processing parameter. At least a portion of the incident light is emitted to and passes through a first position and a second position of a first area of a mask, to detect a first parameter and a second parameter respectively corresponding to the first position and the second position, and then the variation of the first parameter and the second parameter is compared. Additionally, at least a portion of the incident light is emitted to and passes through a third position and a fourth position of a second area of a mask, to detect a third parameter and a fourth parameter respectively corresponding to the third position and the fourth position, and then the variation of the third parameter and the fourth parameter is also compared.