The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
Dec. 20, 2013
Cymer, Llc, San Diego, CA (US);
Vahan Senekerimyan, San Diego, CA (US);
Martijn Wehrens, Waalre, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method and apparatus for improved control of the trajectory and timing of droplets of target material in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. A droplet illumination module generates a laser curtain, and sensors detect the droplets as they pass through the curtain. One sensor in combination with a controller detects the position of the droplets relative to a desired trajectory to the irradiation site so that a signal can be sent to an actuator of a droplet generator to adjust orientation of the droplet generator and direct subsequent droplets to the irradiation site, as in the prior art. A second sensor, or droplet detection module, also detects each droplet as it passes through the curtain, and in combination with a controller determines when the source laser should generate a pulse so that the pulse will arrive at the irradiation site at the same time as the droplet, and sends a signal to the source laser to fire at the correct time.