The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
Jun. 06, 2011
Masako Saito, Tokyo, JP;
Ichiro Hiratsuka, Tokyo, JP;
Masahiro Wada, Tokyo, JP;
Ryota Chiba, Tokyo, JP;
Takuya Kanazawa, Tokyo, JP;
Osamu Yoshioka, Tokyo, JP;
Takehito Tsukamoto, Tokyo, JP;
Junko Toda, Tokyo, JP;
Masako Saito, Tokyo, JP;
Ichiro Hiratsuka, Tokyo, JP;
Masahiro Wada, Tokyo, JP;
Ryota Chiba, Tokyo, JP;
Takuya Kanazawa, Tokyo, JP;
Osamu Yoshioka, Tokyo, JP;
Takehito Tsukamoto, Tokyo, JP;
Junko Toda, Tokyo, JP;
Adeka Corporation, Tokyo, JP;
Abstract
A curable composition includes: 100 parts by mass of a silicon-containing polymer having a Mw of 3,000 to 100,000 obtainable by hydrolysis-condensation of an organosilane mixture including RSiX, RSiX, RRSiXand RSiX, the total of RSiXand RRSiX2 being 5 to 60 mol %, optionally a prepolymer, optionally a cyclic siloxane compound, 0.0001 to 10 parts by mass of an organic peroxide and optionally a metal catalyst, and 10 to 1,500 parts by mass of a filler, wherein Ris a C2-6 alkenyl group, Ris a C1-6 alkyl group, Rand Rare each a C1-6 alkyl group, Ris a phenyl group optionally substituted with a C1-6 alkyl group, and X is a C1-6 alkoxy group, one or more of Rto Ris a methyl group, f represents a number of 2 to 10, g represents a number of 0 to 8, and n represents 1 or 2.