The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2014

Filed:

Nov. 10, 2009
Applicants:

Hideo Hada, Kawasaki, JP;

Yoshiyuki Utsumi, Kawasaki, JP;

Takehiro Seshimo, Kawasaki, JP;

Akiya Kawaue, Kawasaki, JP;

Inventors:

Hideo Hada, Kawasaki, JP;

Yoshiyuki Utsumi, Kawasaki, JP;

Takehiro Seshimo, Kawasaki, JP;

Akiya Kawaue, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kanagawa-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1') and/or a compound represented by (b1-1″) (R″-R″ represents an aryl group or an alkyl group, provided that at least one of R″-R″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R″-R″ may be mutually bonded to form a ring with the sulfur atom; X represents a C-Chydrocarbon group; Qrepresents a carbonyl group-containing divalent linking group; Xrepresents a C-Chydrocarbon group; Qrepresents a single bond or a divalent linking group; Yrepresents —C(═O)— or —SO—; Yrepresents a C-Calkyl group or a fluorinated alkyl group: Qrepresents a single bond or an alkylene group; and W represents a C-Calkylene group).


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