The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
Sep. 20, 2010
Applicant:
Thomas E. Winter, Parsonsfield, ME (US);
Inventor:
Thomas E. Winter, Parsonsfield, ME (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/52 (2006.01); C23C 16/44 (2006.01); C23C 16/46 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
C23C 16/46 (2013.01); C23C 16/4412 (2013.01); C23C 16/4401 (2013.01); C23C 16/52 (2013.01); C23C 16/56 (2013.01);
Abstract
An Exhaust Gas Analyzer (EGA) subsystem for monitoring exhaust gasses, for controlling and rapidly adjusting the processing conditions within a processing chamber in a thermal processing unit used for heating-treating wafers before and/or during Post Application Bake (PAB) procedures. The EGA subsystem can be used to control and/or optimize the heat-treating of coated wafers at different bake plate temperatures, and the EGA subsystem can provide a high wafer throughput.